Monolithic High-Mobility InAs on Oxide Grown at Low Temperature

Author:

Sarkar Debarghya1ORCID,Tao Jun1ORCID,Ahsan Ragib1ORCID,Yang Dingzhu1,Orvis Thomas2,Weng Sizhe1,Greer Frank3,Ravichandran Jayakanth2ORCID,Sideris Constantine1ORCID,Kapadia Rehan1ORCID

Affiliation:

1. Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, California 90089, United States

2. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States

3. Microdevices Laboratory, NASA Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109, United States

Funder

Army Research Office

Air Force Office of Scientific Research

University of Southern California

Semiconductor Research Corporation

National Aeronautics and Space Administration

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. Fenouillet-Beranger, C.; Previtali, B.; Batude, P.; Nemouchi, F.; Casse, M.; Garros, X.; Tosti, L.; Rambal, N.; Lafond, D.; Dansas, H. FDSOI bottom MOSFETs stability versus top transistor thermal budget featuring 3D monolithic integration, 44th European Solid State Device Research Conference (ESSDERC), 2014, pp 110–113.

2. Ultrathin compound semiconductor on insulator layers for high-performance nanoscale transistors

3. Recent progress in lasers on silicon

4. Wafer-scale integration of group III–V lasers on silicon using transfer printing of epitaxial layers

5. GaAs photovoltaics and optoelectronics using releasable multilayer epitaxial assemblies

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