An Upper Limit on the Formation of NO(X2Πr) in the Reactions + O(3P) and + at 298 K
Author:
Affiliation:
1. Orion International Technologies, Phillips Laboratory/GPID, 29 Randolph Road, Hanscom AFB, Massachusetts 01731-3010
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry,General Engineering
Link
https://pubs.acs.org/doi/pdf/10.1021/jp960164v
Reference65 articles.
1. Quenching of N2(a 1Πg, v’=0) by N2, O2, CO, CO2, CH4, H2, and Ar
2. Quenching rate coefficients for N2(a′ 1Σ−u)
3. Lifetime of the N2 Vegard–Kaplan System
4. N2 Vegard–Kaplan System in Absorption
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