Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function-Reference-Cited by-同舟云学术

Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function

Published:2014-06-30 Issue:8 Volume:14 Page:4406-4412
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Manfrinato Vitor R.¹²³,Wen Jianguo¹²³,Zhang Lihua¹²³,Yang Yujia¹²³,Hobbs Richard G.¹²³,Baker Bowen¹²³,Su Dong¹²³,Zakharov Dmitri¹²³,Zaluzec Nestor J.¹²³,Miller Dean J.¹²³,Stach Eric A.¹²³,Berggren Karl K.¹²³

Affiliation:

1. Electrical Engineering and Computer Science Department, MIT, Cambridge, Massachusetts 02139, United States

2. Electron Microscopy Center, Argonne National Laboratory, Lemont, Illinois 60439, United States

3. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

Funder

Gordon and Betty Moore Foundation

U.S. Department of Energy

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl5013773

Reference53 articles.

1. Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

3. Complex self-assembled patterns using sparse commensurate templates with locally varying motifs

4. Design rules for self-assembled block copolymer patterns using tiled templates

5. Optimizing Topographical Templates for Directed Self-Assembly of Block Copolymers via Inverse Design Simulations

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