Difluoromethylborates and Muonium for the Study of Isonitrile Insertion Affording Phenanthridines via Imidoyl Radicals

Author:

Konagaya Kakeru1,Huang Yu-En1,Iwami Kazuki1,Fujino Tetsuya1,Abe Rikutaro1,Parchment-Morrison Reuben23,Kojima Kenji M.34,McKenzie Iain356,Ito Shigekazu1ORCID

Affiliation:

1. Department of Applied Chemistry, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-H-113 Ookayama, Meguro-ku, Tokyo 152-8552, Japan

2. School of Physics and Astronomy, Cardiff University, Queen’s Building, The Parade, Cardiff CF24 3AA, U.K.

3. Centre for Molecular and Materials Science, TRIUMF, 4004 Wesbrook Mall, Vancouver, British Columbia V6T 2A3, Canada

4. Stewart Blusson Quantum Matter Institute, 2355 East Mall, Vancouver, British Columbia V6T 1Z4, Canada

5. Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, British Columbia V5A 1S6, Canada

6. Department of Physics and Astronomy, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada

Funder

Compute Canada

Western Canada Research Grid

Japan Society for the Promotion of Science

Natural Sciences and Engineering Research Council of Canada

Nissan Chemical Corporation

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry

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