Adsorption and Thermal Reaction of Short-Chain Iodoalkanes on Ge(100)
Author:
Affiliation:
1. Department of Chemistry, National Taiwan Normal University, Taipei 116, Taiwan, Department of Chemistry, Tunghai University, Taichung 407, Taiwan
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp904178a
Reference39 articles.
1. HfO2 high-κ gate dielectrics on Ge (100) by atomic oxygen beam deposition
2. Effects of the oxygen precursor on the electrical and structural properties of HfO2 films grown by atomic layer deposition on Ge
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4. The Stabilization of Germanium Surfaces by Ethylation
5. Self-Assembly of Alkyl Monolayers on Ge(111)1a
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