Stress Management in Thin-Film Gas-Permeation Barriers
Author:
Affiliation:
1. Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119 Wuppertal, Germany
2. Philips GmbH, Philipsstrasse 8, 52068 Aachen, Germany
3. Philips Research, High Tech Campus 7, 5656AE Eindhoven, The Netherlands
Funder
Bundesministerium f?r Bildung und Forschung
Nordrhein-Westfalen
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.5b11499
Reference21 articles.
1. Atomistic Origins of High-Performance in Hybrid Halide Perovskite Solar Cells
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4. The origin of low water vapor transmission rates through Al2O3/ZrO2 nanolaminate gas-diffusion barriers grown by atomic layer deposition
5. Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
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