Facile Routes To Improve Performance of Solution-Processed Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Facile Routes To Improve Performance of Solution-Processed Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing

Published:2015-06-12 Issue:24 Volume:7 Page:13289-13294
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Park Won-Tae¹,Son Inyoung²,Park Hyun-Woo³,Chung Kwun-Bum³,Xu Yong¹,Lee Taegweon²,Noh Yong-Young¹

Affiliation:

1. Department of Energy and Materials Engineering, Dongguk University, 26 Pil-dong, 3 ga, Jung-gu, Seoul 100-715, South Korea

2. Advanced Materials Research Institute, Samsung Fine Chemicals Co., Ltd., Suwon, Gyeongi 443-803, South Korea

3. Division of Physics and Semiconductor Science, Dongguk University, 26 Pil-dong, 3 ga, Jung-gu, Seoul 100-715, South Korea

Funder

National Research Foundation of Korea

Samsung

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b04374

Reference15 articles.

1. 3.1: Distinguished Paper: 12.1-Inch WXGA AMOLED Display Driven by Indium-Gallium-Zinc Oxide TFTs Array

2. Review of recent developments in amorphous oxide semiconductor thin-film transistor devices

3. Flexible full color organic light-emitting diode display on polyimide plastic substrate driven by amorphous indium gallium zinc oxide thin-film transistors

4. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

5. Simple Bar-Coating Process for Large-Area, High-Performance Organic Field-Effect Transistors and Ambipolar Complementary Integrated Circuits

Cited by 48 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Viable Approach of Tuning Oxide Semiconductor Thin Films in Solution‐Processed Heterojunction Thin Films Transistors for Both Higher Performances and Stability;Advanced Electronic Materials;2024-08-27

2. Fully Printed Negative-Capacitance Field-Effect Transistors with Ultralow Subthreshold Swing and High Inverter Signal Gain;ACS Applied Materials & Interfaces;2024-07-16

3. Intense pulsed light annealing of solution-based indium–gallium–zinc–oxide semiconductors with printed Ag source and drain electrodes for bottom gate thin film transistors;Scientific Reports;2024-01-18

4. Low-Temperature Enhancement-Mode Amorphous Oxide Thin-Film Transistors in Solution Process Using a Low-Pressure Annealing;Nanomaterials;2023-08-01

5. All-printed thin film transistor with a solution-based Indium- Gallium-Zinc-Oxide semiconductor and printed Ag electrodes via intense pulsed light annealing;2023-06-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3