Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Published:2015-05-01 Issue:18 Volume:7 Page:9736-9743
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Reinke Michael¹²,Kuzminykh Yury¹²,Hoffmann Patrik¹²

Affiliation:

1. Laboratory for Advanced Materials Processing, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland

2. Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lau-sanne, Station 17, CH-1015 Lausanne, Switzerland

Funder

Schweizerische Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b01561

Reference26 articles.

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4. Comparative study on methods to structure sapphire

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