Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography-Reference-Cited by-同舟云学术

Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography

Published:2011-02-15 Issue:9 Volume:133 Page:2812-2815
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Voet Vincent S. D.¹,Pick Teresa E.¹,Park Sang-Min¹,Moritz Manuel¹,Hammack Aaron T.¹,Urban Jeffrey J.¹,Ogletree D. Frank¹,Olynick Deirdre L.¹,Helms Brett A.¹

Affiliation:

1. The Molecular Foundry, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja1094292

Reference38 articles.

1. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

2. Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up

3. Patternable Block Copolymers

4. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

5. Enabling nanotechnology with self assembled block copolymer patterns

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