Selective Deposition of a Cross-Linked Low-Permittivity Polycarbosilane on Copper
Author:
Affiliation:
1. Materials Science & Engineering Department and Chemistry Department, Rensselaer Polytechnic Institute, Troy, New York 12180
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am100441t
Reference21 articles.
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