Synthesis and Morphological Behavior of Silicon-Containing Triblock Copolymers for Nanostructure Applications-Reference-Cited by-同舟云学术

Synthesis and Morphological Behavior of Silicon-Containing Triblock Copolymers for Nanostructure Applications

Published:1998-07-22 Issue:8 Volume:10 Page:2109-2115
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Avgeropoulos Apostolos¹,Z-H Chan Vanessa¹,Lee Victor Y.¹,Ngo Don¹,Miller Robert D.¹,Hadjichristidis Nikos¹,Thomas Edwin L.¹

Affiliation:

1. Department of Chemistry, University of Athens, Panepistimiopolis, 157 71 Zografou, Athens, Greece, Department of Materials Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, and IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm970682y

Reference31 articles.

1. Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks

2. Resists for microlithography: Present status and recent research trends

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