Characterization of Phonon Vibrations of Silica Bilayer Films-Reference-Cited by-同舟云学术

Characterization of Phonon Vibrations of Silica Bilayer Films

Published:2019-03-07 Issue:12 Volume:123 Page:7110-7117
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Richter Nina F.¹,Feiten Felix E.²,Pal Jagriti²,Plucienik Agata²,Emmez Emre²,Shaikhutdinov Shamil²^ORCID,Kuhlenbeck Helmut²,Risse Thomas¹^ORCID,Freund Hans-Joachim²^ORCID,Goikoetxea Itziar³,Włodarczyk Radosław³,Sauer Joachim³^ORCID

Affiliation:

1. Institut für Chemie und Biochemie, Freie Universität Berlin, Takustr. 3, 14195 Berlin, Germany

2. Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany

3. Institut für Chemie, Humboldt Universität zu Berlin, Unter den Linden 6, 10099 Berlin, Germany

Funder

Max-Planck-Gesellschaft

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

http://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.8b10478

Reference54 articles.

1. X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface

2. Structure and vibrational spectra of crystalline SiO2 ultra-thin films on Mo(112)

3. New approach to the preparation of ultrathin silicon dioxide films at low temperatures

4. The preparation and characterization of ultra-thin silicon dioxide films on a Mo(110) surface

5. Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface

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