Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants-Reference-Cited by-同舟云学术

Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants

Author:

Seo Seunggi¹,Woo Whang Je¹,Lee Yujin¹,Yoon Hwi¹,Kim Miso²,Oh Il-Kwon¹³^ORCID,Chung Seung-Min¹,Kim Hyungjun¹^ORCID,Shong Bonggeun²^ORCID

Affiliation:

1. School of Electrical and Electronics Engineering, Yonsei University, Seoul 03722, Republic of Korea

2. Department of Chemical Engineering, Hongik University, Seoul 04066, Republic of Korea

3. Department of Electrical and Computer Engineering, Ajou University, Suwon 16499, Republic of Korea

Funder

National Research Foundation of Korea

Korea Institute for Advancement of Technology

Korea Evaluation Institute of Industrial Technology

Samsung Display Co., LTD

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference48 articles.

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