Impact of Silica Surface Nanoconfinement on the Microstructure of Alkoxysilane Layers Grafted by Supercritical Carbon Dioxide-Reference-Cited by-同舟云学术

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Impact of Silica Surface Nanoconfinement on the Microstructure of Alkoxysilane Layers Grafted by Supercritical Carbon Dioxide

Published:2019-04-12 Issue:19 Volume:123 Page:12305-12312
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Rébiscoul Diane¹^ORCID,Sananes Israel Susan¹^ORCID,Tardif Samuel²^ORCID,Larrey Vincent³,Ayral André⁴,Rieutord Francois²

Affiliation:

1. CEA, ICSM—UMR 5257 CEA-CNRS-UM-ENSCM, 30207 Bagnols-sur-Cèze Cedex, France

2. Univ. Grenoble Alpes, CEA, IRIG-MEM, F-38000 Grenoble, France

3. Univ. Grenoble Alpes, CEA, LETI, F-38000 Grenoble, France

4. Institut Européen des Membranes, IEM, UMR-5635, Université de Montpellier, ENSCM, CNRS, Place Eugène Bataillon, 34095 Montpellier Cedex 5, France

Funder

Universit? de Montpellier

Commissariat ? l'?nergie Atomique et aux ?nergies Alternatives

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.9b01967

Reference34 articles.

1. An overview of supercritical CO2 applications in microelectronics processing

2. Alkoxysilane layers deposited by SC CO2 process on silicon oxide for microelectronics applications

3. Alkoxysilane Layers Compatible with Copper Deposition for Advanced Semiconductor Device Applications

4. Alkoxysilane layers compatible with Cu deposition: Towards new diffusion barriers?

5. Mesoporous materials in the field of nuclear industry: applications and perspectives

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Organosilicone Compounds in Supercritical Carbon Dioxide;Polymers;2022-06-11

2. Tailored structuring of functionalized silsesquioxanes in a one-step approach;Materials Chemistry Frontiers;2021

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