Etching-Induced Longitudinal Phase Inhomogeneity in Fractal Silicon: Identification through Depth-Profiled Raman Mapping-Reference-Cited by-同舟云学术

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Etching-Induced Longitudinal Phase Inhomogeneity in Fractal Silicon: Identification through Depth-Profiled Raman Mapping

Published:2023-06-21 Issue:26 Volume:127 Page:12606-12612
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Tanwar Manushree¹²^ORCID,Rani Chanchal¹,Kandpal Suchita¹,Ghosh Tanushree¹^ORCID,Mondal Puspen³,Kumar Rajesh¹⁴^ORCID

Affiliation:

1. Materials and Device Laboratory, Department of Physics, Indian Institute of Technology Indore, Simrol 453552, India

2. Department of Chemistry, University of Pennsylvania, 231S. 34 Street, Philadelphia, Pennsylvania 19104-6323, United States

3. Lithography & Microscopy Lab, Synchrotrons Utilization Section, Raja Ramanna Centre for Advanced Technology, Indore 452013, India

4. Centre for Advanced Electronics, Indian Institute of Technology Indore, Simrol 453552, India

Funder

Science and Engineering Research Board

Department of Science and Technology, Ministry of Science and Technology, India

University Grants Committee

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c01333

Reference51 articles.

1. Review of amorphous and polycrystalline thin film silicon solar cell performance parameters

2. Scalable synthesis of ant-nest-like bulk porous silicon for high-performance lithium-ion battery anodes

3. Applications of hierarchically structured porous materials from energy storage and conversion, catalysis, photocatalysis, adsorption, separation, and sensing to biomedicine

4. MnOx-decorated carbonized porous silicon nanowire electrodes for high performance supercapacitors

5. Ultra high density three dimensional capacitors based on Si nanowires array grown on a metal layer

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