Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition

Published:2017-11-20 Issue:47 Volume:121 Page:26465-26471
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Imam Mewlude¹²,Souqui Laurent¹,Herritsch Jan³,Stegmüller Andreas³,Höglund Carina¹²,Schmidt Susann¹,Hall-Wilton Richard²⁴^ORCID,Högberg Hans¹,Birch Jens¹^ORCID,Tonner Ralf³^ORCID,Pedersen Henrik¹^ORCID

Affiliation:

1. Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden

2. European Spallation Source ERIC, P.O. Box 176, SE-221 00 Lund, Sweden

3. Fachbereich Chemie and Material Sciences Center, Philipps-Universität Marburg, Hans-Meerwein-Strasse 4, D-35032 Marburg, Germany

4. Mid-Sweden University, SE-85170 Sundsvall, Sweden

Funder

Deutsche Forschungsgemeinschaft

Knut och Alice Wallenbergs Stiftelse

Stiftelsen f?r?Strategisk Forskning

Strategic Research Area in Materials Science on Functional Materials, Link?ping University

European Spallation Source ERIC

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

http://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.7b09538

Reference27 articles.

1. Filament activated chemical vapor deposition of boron carbide coatings

2. Structural characterisation of B4C films deposited by laser-assisted CVD

3. Structure of an Amorphous Boron Carbide Film: An Experimental and Computational Approach

4. Deposition and characterization of thin boron-carbide coatings

5. Plasma-enhanced chemical vapor deposition of boron nitride thin films from B2H6–H2–NH3 and B2H6–N2 gas mixtures

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