Monotonically Decreasing Ferromagnetic Resonance Linewidth of Cu/Ni0.81Fe0.19 Bilayer Heterostructures with the Increasing Sputtering Rate of the Cu Layer-Reference-Cited by-同舟云学术

Monotonically Decreasing Ferromagnetic Resonance Linewidth of Cu/Ni0.81Fe0.19 Bilayer Heterostructures with the Increasing Sputtering Rate of the Cu Layer

Published:2021-10-26 Issue:43 Volume:125 Page:24025-24031
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Li Yaojin¹²,Li Chunlei¹²,Lu Qi¹²,Du Qin¹²,Shi Keqing³,Hu Zhongqiang¹²^ORCID,Zhou Ziyao¹²^ORCID,Liu Ming¹²^ORCID,Pan Jingye³

Affiliation:

1. Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronics and Information Engineering, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi’an Jiaotong University, Xi’an 710049, China

2. Xi’an Jiaotong University (Yantai) Research Institute for Intelligent Sensing Technology and System, Yantai, 264006, China

3. Department of Intensive Care, Precision Medicine Center Laboratory, The First Affiliated Hospital of Wenzhou Medical University, Wenzhou 325000, P. R. China

Funder

State Administration of Foreign Experts Affairs

Ministry of Education of the People's Republic of China

Ministry of Science and Technology of the People's Republic of China

China Postdoctoral Science Foundation

National Natural Science Foundation of China

Natural Science Foundation of Shaanxi Province

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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