Translating XPS Measurement Procedure for Band Alignment into Reliable Ab Initio Calculation Method
Author:
Affiliation:
1. School of Physics, Southeast University, Nanjing 211189, China
2. Department of Physics, China Pharmaceutical University, Nanjing 211198, China
Funder
National Natural Science Foundation of China
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.7b00900
Reference40 articles.
1. Band engineering at interfaces: theory and numerical experiments
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5. Band Bending in Semiconductors: Chemical and Physical Consequences at Surfaces and Interfaces
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