Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process

Author:

Barreca Davide1ORCID,Carraro Giorgio2ORCID,Fois Ettore3,Gasparotto Alberto2,Gri Filippo2,Seraglia Roberta1,Wilken Martin4,Venzo Alfonso1,Devi Anjana4ORCID,Tabacchi Gloria3ORCID,Maccato Chiara2ORCID

Affiliation:

1. CNR-ICMATE and INSTM, Department of Chemical Sciences, Padova University, 35131 Padova, Italy

2. Department of Chemical Sciences, Padova University and INSTM, 35131 Padova, Italy

3. Department of Science and High Technology, University of Insubria and INSTM, 22100 Como, Italy

4. Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr-University Bochum, 44801 Bochum, Germany

Funder

Universit? degli Studi di Padova

Universit? degli Studi dell'Insubria

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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