Targeting Manganese Amidinate and ß‐Ketoiminate Complexes as Precursors for Mn‐Based Thin Film Deposition

Abstract

AbstractWith a focus on Mn based organometallic compounds with suitable physico‐chemical properties to serve as precursors for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of Mn‐containing materials, systematic synthetic approaches with ligand variation, detailed characterization, and theoretical input from density functional theory (DFT) studies are presented. A series of new homoleptic all‐nitrogen and mixed oxygen/nitrogen‐coordinated Mn(II) complexes bearing the acetamidinate, formamidinate, guanidinate and ß‐ketoiminate ligands have been successfully synthesized for the first time. The specific choice of these ligand classes with changes in structure and coordination sphere and side chain variations result in significant structural differences whereby mononuclear and dinuclear complexes are formed. This was supported by density functional theory (DFT) studies. The compounds were thoroughly characterized by single crystal X‐ray diffraction, magnetic measurements, mass spectrometry and elemental analysis. To evaluate their suitability as precursors for deposition of Mn‐based materials, the thermal properties were investigated in detail. Mn(II) complexes possessing the most promising thermal properties, namely Bis(N,N’‐ditertbutylformamidinato)manganese(II) (IV) and Bis(4‐(isopropylamino)pent‐3‐en‐2‐onato)manganese(II) (ßIII) were used in reactivity studies with DFT to explore their interaction with oxidizing co‐reactants such as oxygen and water which will guide future CVD and ALD process development.