Atomic Calligraphy: The Direct Writing of Nanoscale Structures Using a Microelectromechanical System-Reference-Cited by-同舟云学术

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Atomic Calligraphy: The Direct Writing of Nanoscale Structures Using a Microelectromechanical System

Published:2013-06-24 Issue:7 Volume:13 Page:3379-3384
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Imboden Matthias,Han Han,Chang Jackson,Pardo Flavio¹,Bolle Cristian A.¹,Lowell Evan²,Bishop David J.³

Affiliation:

1. SLIM Line, Bell Laboratories, Alcatel-Lucent, Murray Hill, New Jersey 07974, United States

2. Department of Mechanical Engineering, Boston University, Boston, Massachusetts 02215, United States

3. Division of Materials Science and Engineering, Boston University, Brookline, Massachusetts 02446, United States

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl401699w

Reference28 articles.

1. Pushing the limits of lithography

2. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

3. "Dip-Pen" Nanolithography

4. Nanodispenser for attoliter volume deposition using atomic force microscopy probes modified by focused-ion-beam milling

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