Etching Processes of Polytetrafluoroethylene Surfaces Exposed to He and He–O2 Atmospheric Post-discharges-Reference-Cited by-同舟云学术

Etching Processes of Polytetrafluoroethylene Surfaces Exposed to He and He–O2 Atmospheric Post-discharges

Published:2012-06-04 Issue:25 Volume:28 Page:9466-9474
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Hubert J.¹,Dufour T.¹,Vandencasteele N.¹,Desbief S.²,Lazzaroni R.²,Reniers F.¹

Affiliation:

1. Faculté des Sciences, Service de Chimie Analytique et Chimie des Interfaces, Université Libre de Bruxelles, CP-255, Bld du Triomphe 2, B-1050 Bruxelles, Belgium

2. Service de Chimie des Matériaux Nouveaux, Université de Mons-UMONS/Materia Nova, 20 Place du Parc, 7000 Mons, Belgium

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la300822j

Reference65 articles.

1. Plasma Processing of Polymers

2. A study of atmospheric pressure plasma discharges for surface functionalization of PTFE used in biomedical applications

3. Surface modification of polymer films with a remote atmospheric pressure d.c. glow discharge: influence of substrate location

4. On the low-pressure plasma treatment of PTFE (polytetrafluoroethylene) with SO2 as process gas

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