Route to GaN and VN Assisted by Carbothermal Reduction Process-Reference-Cited by-同舟云学术

Route to GaN and VN Assisted by Carbothermal Reduction Process

Published:2005-10-21 Issue:45 Volume:127 Page:15722-15723
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Zhao Huaizhou¹,Lei Ming¹,Yang Xin'an¹,Jian Jikang¹,Chen Xiaolong¹

Affiliation:

1. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100080, PR China, and Center for Condensed Material Physics, School of Sciences, Beihang University, Beijing 100083, PR China

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja055877i

Reference30 articles.

1. Tribological and protective coatings by chemical vapour deposition

2. Chemical vapor deposition of titanium nitride at low temperatures

3. A high rate sputtering process for the formation of hard friction-reducing TiN coatings on tools

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