Intelligent Agents for the Optimization of Atomic Layer Deposition
Author:
Affiliation:
1. Applied Materials Division, Argonne National Laboratory, Argonne, Illinois 60439, United States
2. Department of Engineering, Computing, and Mathematical Sciences, Lewis University, Romeoville, Illinois 60446, United States
Funder
Argonne National Laboratory
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.1c00649
Reference20 articles.
1. A brief review of atomic layer deposition: from fundamentals to applications
2. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
3. Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality
4. Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor
5. A model-based methodology for the analysis and design of atomic layer deposition processes—Part I: Mechanistic modelling of continuous flow reactors
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