Atomic-Layer-Deposited SiOx/SnOx Nanolaminate Structure for Moisture and Hydrogen Gas Diffusion Barriers-Reference-Cited by-同舟云学术

Atomic-Layer-Deposited SiOx/SnOx Nanolaminate Structure for Moisture and Hydrogen Gas Diffusion Barriers

Published:2021-08-12 Issue:33 Volume:13 Page:39584-39594
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Han Ju-Hwan¹,Lee Seong-Hyeon¹,Jeong Seok-Goo²,Kim Dong-Yeon¹,Yang Hae Lin¹,Lee Seunghwan¹,Yoo Seung Yeon³,Park Inho³,Park Ho Bum³^ORCID,Lim Kwang-Su⁴,Yang Won-Jae⁴,Choi Hyun-Chul⁴,Park Jin-Seong¹^ORCID

Affiliation:

1. Division of Materials Science and Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

2. Division of Nanoscale Semiconductor Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

3. Department of Energy Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea

4. E2 Block LG Science Park (LG Display), 30, Magokjungang 10-ro, Gangseo-gu, Seoul 07796, Republic of Korea

Funder

LG Display

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c09901

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