Deposition of Copper by Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor

Author:

Coyle Jason P.1,Dey Gangotri2,Sirianni Eric R.3,Kemell Marianna L.4,Yap Glenn P. A.3,Ritala Mikko4,Leskelä Markku4,Elliott Simon D.2,Barry Sean T.1

Affiliation:

1. Department of Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, K1S 5B6, Canada

2. Tyndall National Institute, University College Cork, Dyke Parade, Cork, Ireland

3. Department of Chemistry & Biochemistry, University of Delaware, Newark, Delaware 19716, United States

4. Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

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