IR and NMR Study of the Chemisorption of Ammonia on Trimethylaluminum-Modified Silica-Reference-Cited by-同舟云学术

IR and NMR Study of the Chemisorption of Ammonia on Trimethylaluminum-Modified Silica

Published:2000-06-24 Issue:28 Volume:104 Page:6599-6609
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Puurunen Riikka L.¹,Root Andrew¹,Haukka Suvi¹,Iiskola Eero I.¹,Lindblad Marina¹,Krause A. Outi I.¹

Affiliation:

1. Helsinki University of Technology, Industrial Chemistry, P. O. Box 6100, FIN-02015 HUT, Finland, Microchemistry Ltd., P. O. Box 132, FIN-02631 Espoo, Finland, Fortum Oil and Gas Scientific Services, Technology Center, P. O. Box 310, FIN-06100 Porvoo, Finland, and Fortum Oil and Gas Oy, P. O. Box 110, FIN-00048 Fortum, Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp000454i

Reference45 articles.

1. Spectroscopic Study of AlN Film Formation by the Sequential Reaction of Ammonia and Trimethylaluminum on Alumina

2. Metalorganic Surface Chemical Adsorption Deposition of AlN Films by Ammonia and Trimethylaluminum

3. The Electrical and Compositional Properties of AlN ‐ Si Interfaces

4. Mechanism of nucleation and atomic layer growth of aluminum nitride on silicon

5. Low temperature deposition of AIN films by an alternate supply of trimethyl aluminum and ammonia

Cited by 74 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An in situ growth route towards anti-perovskite Ni₃InN nanoparticles embedded within amorphous silicon nitride;Journal of Materials Chemistry A;2024

2. Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride;The Journal of Physical Chemistry C;2023-08-17

3. Introducing trace Co to molybdenum carbide catalyst for efficient ammonia synthesis;AIChE Journal;2023-06-22

4. In situ x-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al₂O₃ on SiO _x /Si: Interface dipole and persistent surface groups;Nanotechnology;2023-03-30

5. Site-Selective Atomic Layer Deposition on Rutile TiO₂: Selective Hydration as a Route to Target Point Defects;The Journal of Physical Chemistry C;2023-01-10