Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants-Reference-Cited by-同舟云学术

Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as the Reactants

Published:2011-03-11 Issue:7 Volume:23 Page:1668-1678
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Seghete D.¹,Rayner G.B.¹,Cavanagh A.S.¹,Anderson V.R.¹,George S.M.¹

Affiliation:

1. Department of Chemistry and Biochemistry, ‡Department of Physics, and §Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309, United States

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm101673u

Reference51 articles.

1. Atomic Layer Deposition: An Overview

2. Atomic layer epitaxy

3. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

4. Ruthenium Thin Films Grown by Atomic Layer Deposition

5. Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum

Cited by 48 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The surface chemistry of the atomic layer deposition of metal thin films;Nanotechnology;2024-06-18

2. Low‐Temperature Dual‐Material Area‐Selective Deposition: Molybdenum Hexafluoride‐Mediated SiO₂ Fluorination/Passivation for Self‐Aligned Molybdenum/Metal Oxide Nanoribbons;Advanced Functional Materials;2024-04-25

3. Electrical behavior of ALD-molybdenum films in the thin-film limit;2024 IEEE 36th International Conference on Microelectronic Test Structures (ICMTS);2024-04-15

4. Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor;Journal of Vacuum Science & Technology A;2024-03-27

5. Selective Chemical Filters for VOF3: Tailoring MgF2 Filter Selectivity through Surface Chemistry;Surfaces;2023-11-19