Air Cushion Press for Excellent Uniformity, High Yield, and Fast Nanoimprint Across a 100 mm Field
Author:
Affiliation:
1. Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544
Publisher
American Chemical Society (ACS)
Subject
Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering
Link
https://pubs.acs.org/doi/pdf/10.1021/nl0615118
Reference12 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography
3. 6 nm half-pitch lines and 0.04 µm2static random access memory patterns by nanoimprint lithography
4. Pattern transfer fidelity of nanoimprint lithography on six-inch wafers
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