Electron Doping in Bottom-Up Engineered Thermoelectric Nanomaterials through HCl-Mediated Ligand Displacement-Reference-Cited by-同舟云学术

Electron Doping in Bottom-Up Engineered Thermoelectric Nanomaterials through HCl-Mediated Ligand Displacement

Author:

Ibáñez Maria¹,Korkosz Rachel J.²,Luo Zhishan¹,Riba Pau¹,Cadavid Doris¹,Ortega Silvia¹,Cabot Andreu¹³,Kanatzidis Mercouri G.²

Affiliation:

1. Catalonia Energy Research Institute−IREC, Sant Adria del Besos, 08930 Barcelona, Spain

2. Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

3. Institució Catalana de Recerca i Estudis Avançats−ICREA, 08010 Barcelona, Spain

Funder

Basic Energy Sciences

China Scholarship Council

Seventh Framework Programme

Agència de Gestió d'Ajuts Universitaris i de Recerca

European Regional Development Fund

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

Reference24 articles.

Cited by 100 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献