High-Resolution Soft X-ray Photoelectron Spectroscopic Studies and Scanning Auger Microscopy Studies of the Air Oxidation of Alkylated Silicon(111) Surfaces-Reference-Cited by-同舟云学术

High-Resolution Soft X-ray Photoelectron Spectroscopic Studies and Scanning Auger Microscopy Studies of the Air Oxidation of Alkylated Silicon(111) Surfaces

Published:2006-10-31 Issue:46 Volume:110 Page:23450-23459
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Webb Lauren J.¹,Michalak David J.¹,Biteen Julie S.¹,Brunschwig Bruce S.¹,Chan Ally S. Y.¹,Knapp David W.¹,Meyer Harry M.¹,Nemanick Eric J.¹,Traub Matthew C.¹,Lewis Nathan S.¹

Affiliation:

1. Division of Chemistry and Chemical Engineering, California Institute of Technology, 210 Noyes Laboratory, 127-72, Pasadena, California 91125, Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers University, Piscataway, New Jersey 08854, and High-Temperature Materials Laboratory, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp063366s

Reference39 articles.

1. Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces

2. Spectroscopic Studies of the Modification of Crystalline Si(111) Surfaces with Covalently-Attached Alkyl Chains Using a Chlorination/Alkylation Method

3. Diels−Alder Reactions of Anthracenes with Dienophiles via Photoinduced Electron Transfer

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