Covalent Attachment of Polyoxometalates to Passivated Si(111) Substrates: A Stable and Electronic Defect-Free Si|POM Platform-Reference-Cited by-同舟云学术

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Covalent Attachment of Polyoxometalates to Passivated Si(111) Substrates: A Stable and Electronic Defect-Free Si|POM Platform

Published:2021-06-24 Issue:26 Volume:125 Page:14287-14298
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Gurrentz Joseph M.¹,Rose Michael J.¹^ORCID

Affiliation:

1. Department of Chemistry, The University of Texas at Austin, Austin, Texas 78757, United States

Funder

Welch Foundation

Office of Naval Research Global

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c04015

Reference55 articles.

1. Functionalization of Oxide-Free Silicon Surfaces with Redox-Active Assemblies

2. Visible-light-absorbing semiconductor/molecular catalyst hybrid photoelectrodes for H2 or O2 evolution: recent advances and challenges

3. Polyoxometalates on Functional Substrates: Concepts, Synergies, and Future Perspectives

4. Functionalization and post-functionalization: a step towards polyoxometalate-based materials

5. Polyoxometalate-based functional nanostructured films: Current progress and future prospects

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3. Surface Immobilization of a Re(I) Tricarbonyl Phenanthroline Complex to Si(111) through Sonochemical Hydrosilylation;ACS Applied Materials & Interfaces;2022-12-22

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