Radio Frequency Glow Discharge-Optical Emission Spectrometry For Direct Quantitative Analysis of Glass-Reference-Cited by-同舟云学术

Radio Frequency Glow Discharge-Optical Emission Spectrometry For Direct Quantitative Analysis of Glass

Published:2004-01-21 Issue:4 Volume:76 Page:1039-1044
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Fernández Beatriz¹,Bordel Nerea¹,Pereiro Rosario¹,Sanz-Medel Alfredo¹

Affiliation:

1. Department of Physical and Analytical Chemistry, Faculty of Chemistry, University of Oviedo, Julian Clavería, 8, 33006 Oviedo, Spain, and Department of Physics, Faculty of Sciences, University of Oviedo, 33006 Oviedo, Spain

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ac035113q

Reference23 articles.

1. Marcus, R. K., Broekaert, J. A. C., Eds.Glow Discharge Plasmas inAnalytical Spectroscopy; John Wiley & Sons Ltd. Chichester, U.K., 2003.

2. Payling, R., Jones, D. G., Bengtson, A., Eds.Glow Discharge OpticalEmission Spectrometry; John Wiley & Sons Ltd. Chichester, U.K., 1997.

3. Glow discharge optical emission spectrometry: moving towards reliable thin film analysis–a short review

4. Optimization of secondary cathode thickness for direct current glow discharge mass spectrometric analysis of glass

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The formation of an oscillating system during the sputtering of sapphire single crystal with pulsed glow discharge;Solid State Sciences;2018-09

2. Technical note: Characterization of gold coated ceramics by radiofrequency pulsed glow discharge – time of flight mass spectrometry;Journal of Analytical Atomic Spectrometry;2018

3. Depth profile characterization of Zn–TiO2 nanocomposite films by pulsed radiofrequency glow discharge-optical emission spectrometry;Talanta;2011-04

4. Analytical performance of pulsed radiofrequency glow discharge optical emission spectrometry for bulk and in-depth profile analysis of conductors and insulators;J. Anal. At. Spectrom.;2011

5. Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS;J. Anal. At. Spectrom.;2011