Design of Volatile Mixed-Ligand Tantalum(V) Compounds as Precursors to Ta2O5 Films-Reference-Cited by-同舟云学术

Design of Volatile Mixed-Ligand Tantalum(V) Compounds as Precursors to Ta2O5 Films

Published:2015-02-19 Issue:3 Volume:15 Page:1141-1149
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Appel Linus¹,Fiz Raquel¹,Tyrra Wieland¹,Pantenburg Ingo¹,Mathur Sanjay¹²

Affiliation:

1. Institute of Inorganic Chemistry, Chair, Inorganic and Material Chemistry, University of Cologne, Greinstrasse 6, 50939, Cologne, Germany

2. International Research Center for Renewable Energy, School of Energy & Power Engineering, Xian Jiaotong University, Xian, Shaanxi 710049, P.R. China

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg501438k

Reference53 articles.

1. Recent topics of research and development of catalysis by niobium and tantalum oxides

2. Total catalytic oxidation of toluene using Pd impregnated on hierarchically porous Nb2O5 and Ta2O5 supports

3. Thermal stability of Ta2O5 in metal–oxide–metal capacitor structures

4. Electrical characteristics of Ta2O5 based capacitors with different gate electrodes

5. Influence of the metal electrode on the characteristics of thermal Ta2O5 capacitors

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