Chemical and Spectroscopic Aspects of Polymer Ablation: Special Features and Novel Directions
Author:
Affiliation:
1. Paul Scherrer Institut, 5232 Villigen PSI, Switzerland, and Washington State University, Pullman, Washington 99164-2814 USA
Publisher
American Chemical Society (ACS)
Subject
General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cr010460q
Reference395 articles.
1. Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser
2. Self‐developing photoetching of poly(ethylene terephthalate) films by far‐ultraviolet excimer laser radiation
3. Laser Processing and Chemistry
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