Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)2(tmhd)2 on Ru or RuO2 Substrates-Reference-Cited by-同舟云学术

Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)2(tmhd)2 on Ru or RuO2 Substrates

Published:2011-01-06 Issue:4 Volume:23 Page:976-983
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lee Sang Woon¹,Han Jeong Hwan¹,Kim Seong Keun¹,Han Sora¹,Lee Woongkyu¹,Hwang Cheol Seong¹

Affiliation:

1. WCU Hybrid Materials Program, Department of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-744, Korea

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm1026128

Reference24 articles.

1. A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 films

2. Fabrication of hydrogen sensors with transparent titanium oxide nanotube-array thin films as sensing elements

3. THE PREPARATION AND CHARACTERIZATION OF HIGHLY EFFICIENT TITANIUM OXIDE–BASED PHOTOFUNCTIONAL MATERIALS

4. Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

5. High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review;Current Applied Physics;2024-08

2. Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications;ACS Applied Materials & Interfaces;2024-04-25

3. Toward Advanced High‐ k and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition;Advanced Materials Technologies;2022-10-26

4. Room-Temperature Atomic Layer Deposition of Elemental Antimony;Chemistry of Materials;2022-02-14

5. Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment;Nanotechnology;2021-12-22