Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor-Reference-Cited by-同舟云学术

Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor

Published:2011-12-20 Issue:1 Volume:45 Page:292-304
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Tada Yasuhiko¹²,Yoshida Hiroshi²,Ishida Yoshihito,³,Hirai Tomoyasu³,Bosworth Joan K.⁴,Dobisz Elizabeth⁴,Ruiz Ricardo⁴,Takenaka Mikihito¹,Hayakawa Teruaki³,Hasegawa Hirokazu¹

Affiliation:

1. Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan

2. Hitachi Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan

3. Department of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1-S8-36 O-okayama, Meguro-ku, Tokyo 152-8552, Japan

4. San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Rd., San Jose, California 95135, United States

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma201822a

Reference49 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

3. Patterning and Templating for Nanoelectronics

4. Polyisoprene-Polystyrene Diblock Copolymer Phase Diagram near the Order-Disorder Transition

5. Block Copolymer Thermodynamics: Theory and Experiment

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