Nanolithography Based on Real-Time Electrically Controlled Indentation with an Atomic Force Microscope for Nanocontact Elaboration-Reference-Cited by-同舟云学术

Nanolithography Based on Real-Time Electrically Controlled Indentation with an Atomic Force Microscope for Nanocontact Elaboration

Published:2003-10-03 Issue:11 Volume:3 Page:1599-1602
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Bouzehouane K.¹,Fusil S.¹,Bibes M.¹,Carrey J.¹,Blon T.¹,Le Dû M.¹,Seneor P.¹,Cros V.¹,Vila L.¹

Affiliation:

1. Unité Mixte de Physique CNRS/Thales, Domaine de Corbeville, 91404 Orsay Cedex, France, Université d'Evry, Bat. des Sciences, rue du père Jarlan, 91025 Evry Cedex, France, and Laboratoire PCPM, Université Louvain-La-Neuve, Place croix du sud, 1348 Louvain-La-Neuve, Belgium

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl034610j

Reference16 articles.

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4. Search for point-contact giant magnetoresistance in Co/Cu multilayers

5. Magnon Excitation by Spin Injection in ThinFe/Cr/FeFilms

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