Combined Electrochemical and Quantum Chemical Study of Some Diamine Derivatives as Corrosion Inhibitors for Copper
Author:
Affiliation:
1. Department of Chemistry, Faculty of Arts and Science, Eskişehir Osmangazi University, 26480 Eskişehir, Turkey
Publisher
American Chemical Society (ACS)
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ie200371z
Reference37 articles.
1. Corrosion inhibition of copper by new triazole phosphonate derivatives
2. Investigation on some Schiff bases as HCl corrosioninhibitors for copper
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5. Stripping voltammetric and conductance measurements on corrosion and inhibition of copper in nitric acid
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