Growth Model of MOCVD Polycrystalline ZnO-Reference-Cited by-同舟云学术

Growth Model of MOCVD Polycrystalline ZnO

Published:2009-09-02 Issue:11 Volume:9 Page:4957-4962
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Nicolay S.¹,Faÿ S.¹,Ballif C.¹

Affiliation:

1. Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin film electronics laboratory EPFL-STI-IMT-NE, PV-LAB, Rue Breguet 2, CH-2000 Neuchâtel, Switzerland

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg900732h

Reference28 articles.

1. Optically pumped lasing of ZnO at room temperature

2. Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells

3. Homogeneous Growth of Zinc Oxide Whiskers

4. Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour

5. Morphology evolution of ZnO(000 1̄) surface during plasma-assisted molecular-beam epitaxy

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