Reduction of Tail State on Boron Doped Hydrogenated Amorphous Silicon Oxide Films Prepared at High Hydrogen Dilution-Reference-Cited by-同舟云学术

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Reduction of Tail State on Boron Doped Hydrogenated Amorphous Silicon Oxide Films Prepared at High Hydrogen Dilution

Published:2013-12-01 Issue:12 Volume:13 Page:7826-7833
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j. nanosci. nanotech.

Author:

Park Jinjoo,Iftiquar S. M.,Lee Sunwha,Park Hyeongsik,Shin Chonghoon,Jung Junhee,Lee Youn-Jung,Balaji Nagarajan,Yi Junsin

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Impact of the Micro-Structure within Passivated Layers on the Performance of the a-Si:H/c-Si Heterojunction Solar Cells;Energies;2023-09-18

2. High Performance of Solution-Processed Amorphous p-Channel Copper-Tin-Sulfur-Gallium Oxide Thin-Film Transistors by UV/O3 Photocuring;ACS Applied Materials & Interfaces;2021-04-23

3. Simulation of Growth of Silicon Thin Films on Textured and Non-textured Surface: A Comparative Study;Silicon;2020-08-04

4. Investigation of p-type nanocrystalline silicon oxide thin film prepared at various growth temperatures;Materials Chemistry and Physics;2019-05

5. Development of highly conducting n-type micro-crystalline silicon oxide thin film and its application in high efficiency amorphous silicon solar cell;Materials Science in Semiconductor Processing;2017-08

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