Mobility Degradation Mechanisms of MOSFETs with a High-<I>k</I> Dielectric Layer-Reference-Cited by-同舟云学术

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Mobility Degradation Mechanisms of MOSFETs with a High-k Dielectric Layer

Published:2014-11-01 Issue:11 Volume:14 Page:8215-8218
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Jung Hyun Soo,Ryu Ju Tae,Kim Dong Hun,Kim Tae Whan

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in DC/RF Performance of AlGaN/GaN MIS-HEMT by Incorporating Dual Metal Gate Architecture;IETE Technical Review;2020-11-17

2. Al203 thin films on Silicon and Germanium substrates for CMOS and flash memory applications;AIP Conference Proceedings;2017

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