Theoretical Study of Spontaneous Emission Spectra in GaAsBi/GaAs Quantum Wells

Author:

Nie Rong1,Liu DongFeng1

Affiliation:

1. School of Information Engineering, Guangdong University of Technology, Guangzhou, 510006, P. R. China

Abstract

GaAsBi/GaAs heterojunctions have a type II band arrangement, and the band structure energy of GaAs alloys with diluted Bi content provides a wide range for designing effective band gaps. In this paper, we calculate the electronic energy band structure of GaAsBi/GaAs quantum wells (QWs) with different Bi concentrations under the 8-band K · P model. The calculated results show that the Bi concentration has a great influence on the band gap, valence band, conduction band, and other structures of GaAsBi/GaAs QWs. Based on the band structure, we make systematical simulations on the effects of different quantum well widths, different Bi concentrations, different carrier densities, and different temperatures on the spontaneous emission spectra (SES) of GaAsBi/GaAs QWs. We find that the peaks of SES reduce with the increase of temperature and well width of the quantum well structure. The full width at half maximum (FWHM) of SES at 300 K is 0.1 eV, which is much broader than that at 100 K. The increasing Bi concentration is found to give rise to the blue shift of SES. Finally, the carrier concentration in the quantum well is found to be an important factor that can enhance the SES peak values. The findings in this work are helpful in the design of GaAsBi/GaAs-based optoelectronic devices.

Publisher

American Scientific Publishers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Reference39 articles.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3