Synthesis of Novel Photoacid Generator Containing Resist Polymer for Electron Beam Lithography-Reference-Cited by-同舟云学术

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Synthesis of Novel Photoacid Generator Containing Resist Polymer for Electron Beam Lithography

Published:2012-01-01 Issue:1 Volume:12 Page:725-729
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:J. Nanosci. Nanotech.

Author:

Lee Koh Eun,Kim Min Jeong,Yoo Jae Beom,Mondkar Hemant S.,Sohn Kyunghwa,Lee Haiwon

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-11

2. Increasing the Sensitivity of Nonchemically Amplified Resists by Oxime Sulfonate-Functionalized Polystyrene;ACS Applied Polymer Materials;2024-04-18

3. Photoacid generators. Application and current state of development;Russian Chemical Reviews;2020-02-01

4. Surface crystallization behavior of calcium carbonate in the presence of SMPs secreted by SRB;Journal of Crystal Growth;2019-11

5. A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential;Materials Chemistry Frontiers;2017

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