Effect of Annealing on Surface Morphology and Wettability of NC-FeSi2 Films Produced via Facing-Target Direct-Current Sputtering-Reference-Cited by-同舟云学术

Effect of Annealing on Surface Morphology and Wettability of NC-FeSi2 Films Produced via Facing-Target Direct-Current Sputtering

Published:2019-10-01 Issue:10 Volume:19 Page:6834-6840
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Charoenyuenyao Peerasil¹,Promros Nathaporn¹,Chaleawpong Rawiwan¹,Saekow Bunpot²,Porntheeraphat Supanit²,Yoshitake Tsuyoshi³

Affiliation:

1. Department of Physics, Faculty of Science, King Mongkut’s Institute of Technology Ladkrabang, Bangkok 10520, Thailand 2

2. Photonics Technology Laboratory, Intelligent Devices and Systems Research Unit, National Electronics and Computer Technology Center, Pathumthani 12120, Thailand

3. Department of Applied Science for Electronics and Materials, Kyushu University, Fukuoka 816-8580, Japan

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

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1. Wetting state and mechanical property alteration for the Fe3Si films using rapid thermal annealing under various temperatures;Heliyon;2023-12

2. Physical feature exploration of nanocrystalline FeSi2 surface with argon plasma etching under varying power;Vacuum;2023-12

3. Impact of Rapid Thermal Annealing Under Various Temperatures on the Wetting and Mechanical Traits of Fe3si Films;2023

4. Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment;Coatings;2021-08-01

5. Annealing effects and infrared photoelectric response of β-FeSi2 on Si (100) substrate prepared by pulsed laser deposition;Vacuum;2021-06