Residual Stresses of Sputtering Titanium Thin Films at Various Substrate Temperatures-Reference-Cited by-同舟云学术

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Residual Stresses of Sputtering Titanium Thin Films at Various Substrate Temperatures

Published:2010-07-01 Issue:7 Volume:10 Page:4562-4567
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:J. Nanosci. Nanotech.

Author:

Chang R. C.,Chen F. Y.,Chuang C. T.,Tung Y. C.

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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