Formation of Diamond-Like Carbon Coatings by Chemical Deposition in High Density Plasma

Author:

Leonovich N. V.1,Tovt P. D.1,Kotov D. A.1

Affiliation:

1. Belarusian State University of Informatics and Radioelectronics

Abstract

A developed technological reactor for the formation of a diamond-like carbon coating on substrates up to 200 mm in diameter by chemical vapor deposition in high-density inductively coupled plasma at an operating pressure below 5 Pa is described. The results of experimental studies on obtaining a diamond-like carbon coating in the developed reactor are presented. The dependences of the rate of deposition of a diamond-like carbon coating on the power of the RF discharge, the operating pressure, and the consumption of the film-forming gaseous reagent have been established. Also, for the developed technological reactor, the modes for obtaining diamond-like carbon coatings with the best mechanical properties were established with the following process parameters: RF power 600–900 W, precursor gas flow rate 15–50 cm3/min, the ratio of plasma-forming gas volumes to film-forming gas volume 3:1 at a residual pressure in the working chamber of not more than 4 Pa. It has been shown by Raman spectroscopy that the coatings obtained under efficient conditions contain a significant amount of a diamond-like phase.

Publisher

Belarusian State University of Informatics and Radioelectronics

Subject

General Economics, Econometrics and Finance

Reference6 articles.

1. Ashish V., Ankit K., Niranjan Reddy K., Chellamalai M., Shashikumar P. V. (2014) Diamon-Like Carbon Coating Made by RF Plasma Enhanced Chemical Vapour Deposition for Protective Antireflective Coatings on Germanium. Procedia Materials Science. (5), 1015–1019.

2. Mironov Y., Stepanov R., Osipkov A., Belyaeva A., Makeev M. (2014) Strengthening Diamond Like Carbon Coatings for Optic Materials. Russian – Israeli Bi-National Workshop. (2), 52–59 (in Russian).

3. Robertson J. (2002) Diamond-Like Amorphous Carbon. Materials Science and Engineering. 37, 129–281. DOI: 10.1016/S0927-796X(02)00005-0 (in Russian).

4. Lee H.-W., Kim K.-H., Seo J.-I., Chung C.-W. (2020) Effect of the RF Bias on the Plasma Density in an Argon Inductively Coupled Plasma. Physics of Plasmas. (27), 093508.

5. Yasyunas A. A., Kotov D. A. (2015) The Influence of the Distribution of the Magnetic Field on the Discharge Parameters of the Source of the Induction Discharge. Youth in Science – Supplement to the Journal “News of the National Academy of Sciences of Belarus”, at 5 Part. Minsk, Part 3. Series of Physical and Technical Sciences. 49–53 (in Russian).

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