10.1023/A:1016153622012-Reference-Cited by-同舟云学术

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10.1023/A:1016153622012

Published:2002 Issue:2 Volume:69 Page:275-278
ISSN:0021-9037
Container-title:Journal of Applied Spectroscopy
language:
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Author:

Voloshina T. V.,Zavaritskaya T. N.,Kavetskaya I. V.,Karavanskii V. A.,Romashov D. A.

Publisher

Springer Science and Business Media LLC

Subject

Spectroscopy,Condensed Matter Physics

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Free-Standing Porous Silicon Film Produced by a Pulsed Anodic Etching of n+-Silicon Substrate in an HF: HCl: C2H5 OH: H2O2:H2O Electrolyte: Characterization and Adsorption of Colchicine;Silicon;2020-05-04

2. Excited Intermediates in Silanes Combustion;Key Factors of Combustion;2016-11-15

3. Characterization of hydrophobic, oxidized porous silicon layer formed by anodic etching of n+-type silicon surface in a HF:C2H5OH:HCl:H2O2:H2O electrolyte for bio-application;Applied Physics A;2014-01-17

4. X-ray and synchrotron studies of porous silicon;Semiconductors;2013-08

5. Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching;International Journal of Mass Spectrometry;2010-02

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