Cross Sections of Scattering Processes in Electron-Beam Lithography

Abstract

Modern models that are used to describe the processes of elastic, quasi-elastic, and inelastic scat-tering are considered. For elastic scattering, various forms of the electrostatic interaction potential, the exchange interaction potential, and the correlation-polarization potential are presented. For quasi-elastic processes, including electron-phonon and electron-polaron scattering, a model based on the theory of dielectrics and an empirical model are presented. Inelastic scattering is described based on the energy loss function, which is constructed using three different approaches.