Developing an application for 3D IC chip stacking technology
Author:
Affiliation:
1. Nanoelectronics Research Institute, AIST
2. Faculty of Science and Engeneering, Waseda University
Publisher
The Editorial Committee of Synthesiology
Link
https://www.jstage.jst.go.jp/article/synth/9/1/9_1/_pdf
Reference12 articles.
1. [4] M. Koyanagi, H. Kurino, K. W. Lee, K. Sakuma, N.Miyakawa and H. Itani: Future system-on-silicon LSI chips,IEEE Micro, 18 (4), 17-22 (1998).
2. [5] T. Fukushima, H. Kikuchi, Y. Yamada, T. Konno, J. Liang, K. Sasaki, K. Inamura, T. Tanaka and M. Koyanagi: New three-dimensional integration technology based on reconfigured wafer-on-wafer bonding technique, IEEE Int. El. Devices Meet. (IEDM), 985-988 (2007).
3. [6] K. Takahashi, H. Terao, Y. Tomita, Y. Yamaji, M. Hoshino, T.Sato, T. Morifuji, M. Sunohara and M. Bonkohara: Current status of research and development for three-dimensional chip stack technology, Jpn. J. Appl. Phys., 40, 3032-3037 (2001).
4. [7] J. M. Yannou, “Roadmap Analysis: 3D Wafer Level Packaging”, ESTC2010 Workshop 3D WLP, (2010).
5. [9] M. Kawano, N. Takahashi, Y. Kurita, K. Soejima, M. Komuro and S. Matsui: Three-dimensional packaging technology for stacked DRAM with 3-Gb/s data transfer, IEEE Trans. Electron Devices, 55 (7), 1614 - 1620 (2008).
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6;Applied Surface Science;2023-11
2. FPGA Emulation of Through-Silicon-Via (TSV) Dataflow Network for 3D Standard Chip Stacking System;2023 IEEE Symposium in Low-Power and High-Speed Chips (COOL CHIPS);2023-04-19
3. Estimating residual stresses of silicon wafer from measured full-field deflection distribution;Optics and Lasers in Engineering;2022-01
4. The wetting phenomenon and precursor film characteristics of Sn-37Pb/Cu under ultrasonic fields;Materials Letters;2019-01
5. Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist;Journal of Photopolymer Science and Technology;2018-06-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3